Publications:

2017

98. Yifei Wang, S. R. Narayanan, and Wei Wu, “Field-Assisted Splitting of Pure Water based on Deep-sub-Debye-Length Nanogap Electrochemical Cells” ACS NANO. DOI: 10.1021/acsnano.7b04038.

97. Song, B., Yao, Y., Groenewald, R. E., Wang, Y., Liu, H., Wang, Y., Li, Y., Liu, F., Cronin, S. B., Schwartzberg, A. M., Cabrini, S., Haas, S., Wu, W., “Probing Gap Plasmons Down to Subnanometer Scales Using Collapsible Nanofingers” ACS NANO. DOI: 10.1021/acsnano.7b01468.

96. Yao, Y., Wu, W., “All-Dielectric Heterogeneous Metasurface as an Efficient Ultra-Broadband Reflector” Advanced Optical Materials. DOI: 10.1002/adom. 201700090.

95. Larson, C., Li, Y., Wu, W., Reisler, H., & Wittig, C., “Photoinitiated Dynamics in Amorphous Solid Water via Nanoimprint Lithography” The Journal of Physical Chemistry A. DOI: 10.1021/acs.jpca.7b04560.

2016

94. Y. Yao, H. Liu, Y. Wang, Y. Li, B. Song, R. P. Wang, M. L. Povinelli, and W. Wu, “Nanoimprint-defined, large-area meta-surfaces for unidirectional optical transmission with superior extinction in the visible-to-infrared range” Optics Express. DOI: 10.1364/Oe.24.015362.

93. Yifei Wang, John Stang, Meng Yu, Maksym Tsvetkov, Chi-Chan Wu, Xuan Qin, Eugene Chung, Mahta Moghaddam, Wei Wu, “Microwave Selective Heating Enhancement for Cancer Hyperthermia Therapy Based on Lithographically Defined Micro/Nanoparticles” Advanced Materials Technologies. DOI: 10.1002/admt.201600038.

92. Y. Wang, J. Stang, E. Chung, M. Moghaddam, and W. Wu, “Micro-resonator for Microwave Cancer Therapy” IEEE Journal on Multiscale and Multiphysics Computational Techniques. DOI: 10.1109/jmmct.2016.2592379.

91. J.-B. Wu, H. Zhao, Y. Li, D. Ohlberg, W. Shi, W. Wu, H. Wang, P.-H. Tan, “Monolayer Molybdenum Disulfide Nanoribbons with High Optical Anisotropy” Advanced Optical Materials. DOI: 10.1002/adom.201500707.

2015

90. Yuanrui Li, Huachao Mao, He Liu, Yuhan Yao, Yifei Wang, Boxiang Song, Yong Chen and Wei Wu, “Stereolithography with variable resolutions using optical filter with high-contrast gratings” Journal of Vacuum Science & Technology B. DOI: 10.1116/1.4935336.

89. Yifei Wang, He Liu, Yuanrui Li and Wei Wu, “Low DC-bias silicon nitride anisotropic etching” Journal of Vacuum Science & Technology B. DOI: 10.1116/1.4930298.

88. Yuhan Yao, Yifei Wang, He Liu, Yuanrui Li, Boxiang Song, Wei Wu, “Line width tuning and smoothening for periodical grating fabrication in nanoimprint lithography” Applied Physics A. DOI: 10.1007/s00339-015-9278-x.

87. Yuhan Yao, He Liu, Yifei Wang, Yuanrui Li, Boxiang Song, Alexandre Bratkovsk, Shih-Yuan Wang, Wei Wu, “Nanoimprint lithography: an enabling technology for nanophotonics (Invited)” Applied Physics A. DOI: 10.1007/s00339-015-9438-z.

86. Yuhan Yao, He Liu, Wei Wu, “Fabrication of High Contrast Gratings for the Spectrum Splitting Dispersive Element in a Concentrated Photovoltaic System” Journal of Visualized Experiments. DOI: 10.3791/52913.

85. Q. Xia, W. Wu, G.-Y. Jung, S. Pi, P. Lin, Y. Chen, X. Li, Z. Li, S.-Y. Wang, R. S. Williams, “Nanoimprint lithography enables memristor crossbars and hybrid circuits” Applied Physics A. DOI: 10.1007/s00339-015-9038-y.

84. Steven J. Barcelo, Wei Wu, Xuema Li, Zhiyong Li, R. Stanley Williams, “Nanoimprint lithography of plasmonic platforms for SERS applications (Invited)” Applied Physics A. DOI: 10.1007/s00339-015-9073-8.

2014

83. Yuhan Yao, He Liu and Wei Wu, “Fabrication of high contrast grating using nanoimprint lithography and its application in improving solar conversion efficiency by parallel spectrum splitting” Journal of Vacuum Science & Technology B. DOI: 10.1116/1.4898198.

82. He Liu, Yuhan Yao, Yifei Wang and Wei Wu, “A full color reflective display system based on high contrast gratings” Journal of Vacuum Science & Technology B. DOI: 10.1116/1.4901416.

81. Yuhan Yao, He Liu and Wei Wu, “Spectrum splitting using multi-layer sub-wavelength high-index-contrast grating for solar energy harvesting efficiency improvement (Invited)” Applied Physics A. DOI: 10.1007/s00339-014-8419-y.

80. D.J. Cho, W. Wu, F. Wang, and Y.R. Shen, “Probing the plasmonic band structure of an optical metamaterial” Physical Review B. DOI: 10.1103/PhysRevB.89.035434.

79. A.N. Abbas, G. Liu, B. Liu, L. Zhang, H. Liu, D. Ohlberg, W. Wu, and C. Zhou, “Patterning, Characterization, and Chemical Sensing Applications of Graphene Nanoribbon Arrays Down to 5 nm Using Helium Ion Beam Lithography” ACS Nano. DOI: 10.1021/nn405759v.

78. X. Hu, T. Yang, R. Gu, Y. Cui, C. Yuan, H. Ge, W. Wu, W. Li, and Y. Chen, “A degradable polycyclic cross-linker for UV-curing nanoimprint lithography” Journal of Materials Chemistry C. DOI: 10.1039/C3TC32048K.

2013

77. Y. Shen, L. Yao, Z. Li, J. Kou, Y. Cui, J. Bian, C. Yuan, H. Ge, W.-D. Li, W. Wu, and Y. Chen, “Double transfer UV-curing nanoimprint lithography” Nanotechnology. DOI: 10.1088/0957-4484/24/46/465304 .

2012

76. W.-D. Li, W. Wu, and R.S. Williams, “Combined helium ion beam and nanoimprint lithography attains 4 nm half-pitch dense patterns” Journal of Vacuum Science & Technology B. DOI: 10.1116/1.4758768.

75. Steven J. Barcelo, Ansoon Kim, Wei Wu, and Zhiyong Li, “Fabrication of Deterministic Nanostructure Assemblies with Sub-nanometer Spacing Using a Nanoimprinting Transfer Technique” Acs Nano. DOI: 10.1021/nn3020807.

74. S.J. Barcelo, M. Hu, A. Kim, W. Wu, and Z.Y. Li, “Selective transfer of nanostructured assemblies onto an arbitrary substrate by nanoimprinting” Alternative Lithographic Technologies Iv. DOI: 10.1117/12.916595.

73. W. Wu, R. Walmsley, W.-D. Li, X. Li and R. Williams, “Nanoimprint lithography with ≤60 nm overlay precision” Applied Physics A. DOI: 10.1007/s00339-012-6775-z.

72. J.J. Yang, M.X. Zhang, M.D. Pickett, F. Miao, J.P. Strachan, W.D. Li, W. Yi, D.A.A. Ohlberg, B.J. Choi, W. Wu, J.H. Nickel, G. Medeiros-Ribeiro, and R.S. Williams, “Engineering nonlinearity into memristors for passive crossbar applications” Applied Physics Letters. DOI: 10.1063/1.3693392.

71. D.F. Xia, L. Ye, X. Guo, Y.S. Cui, J.Z. Zhang, C.S. Yuan, H.X. Ge, W. Wu, and Y.F. Chen, “A dual-curable transfer layer for adhesion enhancement of a multilayer UV-curable nanoimprint resist system (Invited)” Applied Physics A. DOI: 10.1007/s00339-012-6911-9.

70. J. Zhang, X. Hu, J. Zhang, Y. Cui, C. Yuan, H. Ge, Y. Chen, W. Wu, and Q. Xia, “A fast thermal-curing nanoimprint resist based on cationic polymerizable epoxysiloxane” Nanoscale Research Letters. DOI: 10.1186/1556-276X-7-380.

69. Q.Q. Gan, W.L. Bai, S.H. Jiang, Y.K. Gao, W.D. Li, W. Wu, and F.J. Bartoli, “Short-Range Surface Plasmon Polaritons for Extraordinary Low Transmission Through Ultra-Thin Metal Films with Nanopatterns” Plasmonics. DOI: 10.1007/s11468-011-9274-8.

2011

68. Q. F. Xia, M. D. Pickett, J. J. Yang, M. X. Zhang, J. Borghetti, X. M. Li, W. Wu, G. Medeiros-Ribeiro, and R. S. Williams, “Impact of geometry on the performance of memristive nanodevices” Nanotechnology. DOI: 10.1088/0957-4484/22/25/254026.

67. F. S. Ou, M. Hu, I. Naumov, A. Kim, W. Wu, A. M. Bratkovsky, X. M. Li, R. S. Williams, and Z. Y. Li, “Hot-Spot Engineering in Polygonal Nanofinger Assemblies for Surface Enhanced Raman Spectroscopy” Nano Letters. DOI: 10.1021/nl201212n.

66. Qiangfei Xia, Matthew D. Pickett, J. Joshua Yang, Xuema Li, Wei Wu, Gilberto Medeiros-Ribeiro, R. Stanley Williams, “Two- and Three-Terminal Resistive Switches: Nanometer-Scale Memristors and Memistors” Advanced Functional Materials. DOI: 10.1002/adfm.201100180.

2010

65. Q. F. Xia, J. J. S. Yang, W. Wu, X. M. Li, and R. S. Williams, “Self-Aligned Memristor Cross-Point Arrays Fabricated with One Nanoimprint Lithography Step” Nano Letters. DOI: 10.1021/nl1017157.

64. W. Wu, M. Hu, F. S. Ou, R. S. Williams, and Z. Y. Li, “Rational Engineering of Highly Sensitive SERS Substrate Based on Nanocone Structures” Advanced Environmental, Chemical, and Biological Sensing Technologies VII. DOI: 10.1117/12.849959.

63. W. Wu, M. Hu, F. S. Ou, Z. Y. Li, and R. S. Williams, “Cones fabricated by 3D nanoimprint lithography for highly sensitive surface enhanced Raman spectroscopy” Nanotechnology. DOI: 10.1088/0957-4484/21/25/255502.

62. D. B. Strukov, D. R. Stewart, J. Borghetti, X. Li, M. Pickett, G. M. Ribeiro, W. Robinett, G. Snider, J. P. Strachan, W. Wu, Q. Xia, J. J. Yang, R. S. Williams, “Gold Nanofingers for Molecule Trapping and Detection” IEEE International Symposium on Circuits and Systems. DOI: 10.1109/ISCAS.2010.5537020.

61. M. Hu, F. S. Ou, W. Wu, I. Naumov, X. M. Li, A. M. Bratkovsky, R. S. Williams, and Z. Y. Li, “Hybrid CMOS/Memristor Circuits” J Am Chem Soc. DOI: 10.1021/ ja105248h.

60. P. Chaturvedi, W. Wu, V. J. Logeeswaran, Z. N. Yu, M. S. Islam, S. Y. Wang, R. S. Williams, and N. X. Fang, “A smooth optical superlens” Applied Physics Letters. DOI: 10.1063/1.3293448.

2009

59. Q. F. Xia, W. Robinett, M. W. Cumbie, N. Banerjee, T. J. Cardinali, J. J. Yang, W. Wu, X. M. Li, W. M. Tong, D. B. Strukov, G. S. Snider, G. Medeiros-Ribeiro, and R. S. Williams, “Memristor-CMOS Hybrid Integrated Circuits for Reconfigurable Logic” Nano Letters. DOI: 10.1021/nl901874j.

58. W. Wu, E. Ponizovskaya, E. Kim, D. Cho, A. Bratkovsky, Z. N. Yu, Q. F. Xia, X. M. Li, Y. R. Shen, S. Y. Wang, and R. S. Williams, “Geometrical dependence of optical negative index meta-materials at 1.55 um” Applied Physics A. DOI: 10.1007/s00339-009-5139-9.

57. L. Vj, N. P. Kobayashi, M. S. Islam, W. Wu, P. Chaturvedi, N. X. Fang, S. Y. Wang, and R. S. Williams, “Ultrasmooth Silver Thin Films Deposited with a Germanium Nucleation Layer” Nano Letters. DOI: 10.1021/nl8027476.

56. D. Morecroft, J. K. W. Yang, S. Schuster, K. K. Berggren, Q. F. Xia, W. Wu, and R. S. Williams, “Sub-15 nm nanoimprint molds and pattern transfer” Journal of Vacuum Science & Technology B. DOI: 10.1116/1.3264670.

55. Z. W. Li, Y. N. Gu, L. Wang, H. X. Ge, W. Wu, Q. F. Xia, C. S. Yuan, Y. Chen, B. Cui, and R. S. Williams, “Hybrid Nanoimprint-Soft Lithography with Sub-15 nm Resolution” Nano Letters. DOI: 10.1021/nl9004892.

54. D. J. Cho, W. Wu, E. Ponizovskaya, P. Chaturvedi, A. M. Bratovksy, S. Y. Wang, X. A. Zhang, F. Wang, and Y. R. Shen, “Ultrafast response of negative index metamaterials in the near-infrared” Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II. DOI: 10.1117/12.808455.

53. D. J. Cho, W. Wu, E. Ponizovskaya, P. Chaturvedi, A. M. Bratovksy, S. Y. Wang, X. A. Zhang, F. Wang, and Y. R. Shen, “Ultrafast modulation of optical metamaterials” Optics Express. DOI: 10.1364/OE.17.017652.

52. D. J. Cho, W. Wu, E. Ponizovskaya, P. Chaturvedi, A. M. Bratkovsky, S. Y. Wang, X. Zhang, F. Wang, and Y. R. Shen, “Ultrafast modulation of optical metamaterials” IEEE Lasers and Electro-Optics. DOI: 10.1364/IQEC.2009.ITuD5.

51. J. Borghetti, Z. Y. Li, J. Straznicky, X. M. Li, D. A. A. Ohlberg, W. Wu, D. R. Stewart, and R. S. Williams, “A hybrid nanomemristor/transistor logic circuit capable of self-programming” P Natl Acad Sci USA. DOI: 10.1073/pnas. 0806642106.

2008

50. W. Wu, W. M. Tong, J. Bartman, Y. F. Chen, R. Walmsley, Z. N. Yu, Q. F. Xia, I. Park, C. Picciotto, J. Gao, S. Y. Wang, D. Morecroft, J. Yang, K. K. Berggren, and R. S. Williams, “Sub-10 nm Nanoimprint Lithography by Wafer Bowing” Nano Letters. DOI: 10.1021/nl802295n.

49. L. Tao, S. Ramachandran, C. T. Nelson, M. Lin, L. J. Overzet, M. Goeckner, G. Lee, C. G. Willson, W. Wu, and W. Hu, “Durable diamond-like carbon templates for UV nanoimprint lithography” Nanotechnology. DOI: 10.1088/0957-4484/ 19/10/105302.

48. V. J. Logeeswaran, A. Sarkar, M. S. Islam, N. P. Kobayashi, J. Straznicky, X. Li, W. Wu, S. Mathai, M. R. T. Tan, S. Y. Wang, and R. S. Williams, “A 14-ps full width at half maximum high-speed photoconductor fabricated with intersecting InP nanowires on an amorphous surface” Applied Physics A. DOI: 10.1007/s00339-007-4394-x.

47. Z. Y. Li, M. D. Pickett, D. Stewart, D. A. A. Ohlberg, X. M. Li, W. Wu, W. Robinett, and R. S. Williams, “Experimental demonstration of a defect-tolerant nanocrossbar demultiplexer” Nanotechnology. DOI: 10.1088/0957-4484/19/16 /165203.

46. Z. Y. Li, X. M. Li, D. A. A. Ohlberg, J. Straznicky, W. Wu, Z. N. Yu, J. Borghetti, W. Tong, D. Stewart, and R. S. Williams, “Fabrication and test of nano crossbar switches/MOSFET hybrid circuits by imprinting lithography” Proc. of SPIE. DOI: 10.1117/12.774144.

45. E. Kim, F. Wang, W. Wu, Z. N. Yu, and Y. R. Shen, “Nonlinear Optical Spectroscopy of Photonic Metamaterials” IEEE Lasers and Electro-Optics. DOI: 10.1103/PhysRevB.78.113102.

44. Evgenia Kim, Feng Wang, Wei Wu, Zhaoning Yu, and Y. Ron Shen, “Nonlinear Optical Spectroscopy of Photonic Metamaterials” Physical Review B. DOI: 10.1103/PhysRevB.78.113102.

2007

43. W. Wu, Z. N. Yu, S. Y. Wang, R. S. Williams, Y. M. Liu, C. Sun, X. Zhang, E. Kim, Y. R. Shen, and N. X. Fang, “Midinfrared metamaterials fabricated by nanoimprint lithography” Applied Physics Letters. DOI: 10.1063/1.2450651.

42. W. Wu, E. Kim, E. Ponizovskaya, Y. Liu, Z. Yu, N. Fang, Y. R. Shen, A. M. Bratkovsky, W. Tong, C. Sun, X. Zhang, S. Y. Wang, and R. S. Williams, “Optical Metamaterials at near and mid-IR range fabricated by nanoimprint lithography” Applied Physics A. DOI: 10.1007/s00339-006-3834-3.

41. L. Vj, N. P. Kobayashi, W. Wu, M. S. Islam, N. X. L. Fang, S. Y. Wang, and R. S. Williams, “Smooth Ag film deposited using e-beam evaporated Ge as an intermediate layer for applications in nanoscale devices and optical superlens” Mater. Res. Soc. Symp. Proc. DOI: 10.1557/PROC-0990-B08-18.

40. L. Vj, M. L. Chan, M. S. Islam, D. A. Horsley, W. Wu, S. Y. Wang, and R. S. Williams, “Surface deformation of metal films under controlled pressure for generating ultra-flat metal surfaces” Mater. Res. Soc. Symp. Proc. DOI: 10.1557/PROC-0990-B08-22.

39. D. R. Stewart, G. Gibson, G. Y. Jung, W. Wu, J. Straznicky, W. Tong, Z. Li, and R. S. Williams, “Direct-write programming of nanoscale demultiplexer arrays” Nanotechnology. DOI: 10.1088/0957-4484/18/41/415201.

38. V.J. Logeeswaran, A.N. Stameroff, M.S. Islam, W. Wu, A.M. Bratkovsky, P.J. Kuekes, S.Y. Wang, and R.S. Williams, “Switching between positive and negative permeability by photoconductive coupling for modulation of electromagnetic radiation” Applied Physics A. DOI: 10.1007/s00339-007-3897-9.

37. V. J. Logeeswaran, M. L. Chan, Y. Bayam, M. S. Islam, D. A. Horsley, X. Li, W. Wu, S. Y. Wang, and R. S. Williams, “Ultra-smooth metal surfaces generated by pressure-induced surface deformation of thin metal films” Applied Physics A. DOI: 10.1007/s00339-006-3836-1.

36. E. Kim, Y. R. Shen, W. Wu, E. Ponizovskaya, Z. Yu, A. M. Bratkovsky, S. Y. Wang, and R. S. Williams, “Modulation of negative index metamaterials in the near-IR range” Applied Physics Letters. DOI: 10.1063/1.2801701.

35. A. S. P. Chang, H. Tan, S. F. Bai, W. Wu, Z. N. Yu, and S. Y. Chou, “Tunable external cavity laser with a liquid-crystal subwavelength resonant grating filter as wavelength-selective mirror” IEEE Photonics Technology Letters. DOI: 10.1109/LPT.2007.899437.

34. A. S. P. Chang, K. J. Morton, H. Tan, P. E. Murphy, W. Wu, and S. Y. Chou, “Tunable liquid crystal-resonant grating filter fabricated by nanoimprint lithography” IEEE Photonics Technology Letters. DOI: 10.1109/LPT.2007. 903719.

2006

33. Z. Yu, W. Wu, G.-Y. Jung, D.L. Olynick, J. Straznicky, X. Li, Z. Li, W.M. Tong, J.A. Liddle, S.-Y. Wang, and R.S. Williams, “Fabrication of 30 nm pitch imprint moulds by frequency doubling for nanowire arrays” Nanotechnology. DOI: 10.1088/0957-4484/17/19/030.

32. W. Wu, E. Kim, E. Ponizovskaya, Y. Liu, Z. Yu, A. Bratkovsky, N. Fang, X. Zhang, S. Y. Wang, and R. S. Williams, “Fabrication of optical meta-structure at infrared rang using nanoimprint lithography” International Symposium on Biophotonics, Nanophotonics and Metamaterials. DOI: 10.1109/METAMAT. 2006.334937.

31. C. Stuart, Q. F. Xu, R. J. Tseng, Y. Yang, H. T. Hahn, Y. Chen, W. Wu, and R. S. Williams, “Nanofabrication module integrated with optical aligner” Journal of Vacuum Science & Technology B. DOI: 10.1116/1.2166861.

30. V.J. Logeeswaran, M.S. Islam, M.L. Chan, D.A. Horsley, W. Wu, S.-Y. Wang, and R.S. Williams, “Realization of 3D isotropic negative index materials using massively parallel and manufacturable microfabrication and micromachlning technology” Mater. Res. Soc. Symp. Proc. DOI: 10.1557/PROC-0919-J02-01.

29. N. H. Li, W. Wu, and S. Y. Chou, “Sub-20-nm alignment in nanoimprint lithography using Moire fringe” Nano Letters. DOI: 10.1021/nl0603395.

28. G.-Y. Jung, E. Johnston-Halperin, W. Wu, Z. Yu, S.-Y. Wang, W.M. Tong, Z. Li, J.E. Green, B.A. Sheriff, A. Boukai, Y. Bunimovich, J.R. Heath, and R.S. Williams, “Circuit fabrication at 17 nm half-pitch by nanoimprint lithography” Nano Letters. DOI: 10.1021/nl052110f.

27. J. Gao, C. Picciotto, W. Wu, I. Park, and W. M. Tong, “From nanoscale displacement sensing and estimation to nanoscale alignment” Journal of Vacuum Science & Technology B. DOI: 10.1116/1.2375089.

26. J. Gao, C. Picciotto, W. Wu, I. Park, and W. M. Tong, “nDSE-based overlay alignment: enabling technology for nanometrology and fabrication” Proc. of SPIE. DOI: 10.1117/12.656610.

25. B. Cui, W. Wu, C. Keimel, and S.Y. Chou, “Filling of nano-via holes by laser-assisted direct imprint” Microelectronic Engineering. DOI: 10.1016/j.mee. 2006.01.087.

2005

24. W. Wu, G.-Y. Jung, D.L. Olynick, J. Straznicky, Z. Li, X. Li, D.A.A. Ohlberg, Y. Chen, S.-Y. Wang, J.A. Liddle, W.M. Tong, and R.S. Williams, “One-kilobit cross-bar molecular memory circuits at 30-nm half-pitch fabricated by nanoimprint lithography (Keynote Paper)” Applied Physics A. DOI: 10.1117/12.607236.

23. W.M. Tong, S.D. Hector, G.-Y. Jung, W. Wu, J. Ellenson, K. Kramer, T. Hostetler, S.K. Richards, and R.S. Williams, “Nanoimprint lithography: The path toward high tech, low cost devices” Proc. of SPIE. DOI: 10.1007/s00339-004-3176-y.

22. C. Picciotto, J. Gao, E. Hoarau, W. Wu, W. Jackson, and W.M. Tong, “Overlay alignment using optical microscopy and arbitrary surface features” Journal of Vacuum Science & Technology B. DOI: 10.1116/1.2062667.

21. C. Picciotto, J. Gao, E. Hoarau, and W. Wu, “Image displacement sensing (NDSE) for achieving overlay alignment” Applied Physics A. DOI: 10.1007/s00339-004-3152-6.

20. X. G. Liang, W. Zhang, M. T. Li, Q. F. Xia, W. Wu, H. X. Ge, X. Y. Huang, and S. Y. Chou, “Electrostatic force-assisted nanoimprint lithography (EFAN)” Nano Letters. DOI: 10.1021/nl0480161.

19. G.-Y. Jung, Z. Li, W. Wu, S. Ganapathiappan, X. Li, D.L. Olynick, S.Y. Wang, W.M. Tong, and R.S. Williams, “Improved pattern transfer in nanoimprint lithography at 30 nm half-pitch by substrate-surface functionalization” Langmuir. DOI: 10.1021/la050021c.

18. G.Y. Jung, W. Wu, Z. Li, S.Y. Wang, W.M. Tong, and R.S. Williams, “Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography” Langmuir. DOI: 10.1021/la0476938.

17. G.-Y. Jung, Z. Li, W. Wu, Y. Chen, D.L. Olynick, S.-Y. Wang, W.M. Tong, and R.S. Williams, “Surface engineering for resolution enhancement in nanoimprint lithography” Proc. of SPIE. DOI: 10.1117/12.599793.

16. G.Y. Jung, W. Wu, Z. Li, S.Y. Wang, W.M. Tong, and R. Stanley Williams, “Resolution enhancement in nanoimprinting by surface energy engineering” Journal of Photopolymer . DOI: 10.1117/12.599793.

15. G. Y. Jung, W. Wu, H. Lee, S. Y. Wang, W. M. Tong, and R. S. Williams, “Fabrication of multi-bit crossbar circuits at sub-50 nm half-pitch by using UV-based nanoimprint lithography” Journal of Photopolymer Science and Technology. DOI: 10.2494/photopolymer.18.565.

14. G. Y. Jung, W. Wu, S. Ganapathiappan, D. A. A. Ohlberg, M. S. Islam, X. Li, D. L. Olynick, H. Lee, Y. Chen, S. Y. Wang, W. M. Tong, and R. S. Williams, “Issues on nanoimprint lithography with a single-layer resist structure” Applied Physics A. DOI: 10.1007/s00339-005-3313-2.

13. H. X. Ge, W. Wu, Z. Y. Li, G. Y. Jung, D. Olynick, Y. F. Chen, J. A. Liddle, S. Y. Wang, and R. S. Williams, “Cross-linked polymer replica of a nanoimprint mold at 30 nm half-pitch” Nano Letters. DOI: 10.1021/nl048618k.

2004

12. M. D. Austin, H. X. Ge, W. Wu, M. T. Li, Z. N. Yu, D. Wasserman, S. A. Lyon, and S. Y. Chou, “Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography” Applied Physics Letters. DOI: 10.1063/1.1766071.

2003

11. Z. N. Yu, H. Gao, W. Wu, H. X. Ge, and S. Y. Chou, “Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff” Journal of Vacuum Science & Technology B. DOI: 10.1116/1.1619958.

10. Z. N. Yu, L. Chen, W. Wu, H. X. Ge, and S. Y. Chou, “Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography” Journal of Vacuum Science & Technology B. DOI: 10.1116/1.1609471.

9. Q. F. Xia, C. Keimel, H. X. Ge, Z. N. Yu, W. Wu, and S. Y. Chou, “Ultrafast patterning of nanostructures in polymers using laser assisted nanoimprint lithography” Applied Physics Letters. DOI: 10.1063/1.1610814.

8. W. Wu, J. Gu, H. X. Ge, C. Keimel, and S. Y. Chou, “Room-temperature Si single-electron memory fabricated by nanoimprint lithography” Applied Physics Letters. DOI: 10.1063/1.1630162.

7. X. Y. Lei, L. Wu, P. Deshpande, Z. N. Yu, W. Wu, H. X. Ge, and S. Y. Chou, “100 nm period gratings produced by lithographically induced self-construction” Nanotechnology. PII: S0957-4484(03)55891-3.

2002

6. H. Cao, Z. N. Yu, J. Wang, J. O. Tegenfeldt, R. H. Austin, E. Chen, W. Wu, and S. Y. Chou, “Fabrication of 10 nm enclosed nanofluidic channels” Applied Physics Letters. DOI: 10.1063/1.1489102.

2001

5. Z. N. Yu, W. Wu, L. Chen, and S. Y. Chou, “Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications” Journal of Vacuum Science & Technology B. DOI: 10.1116/1.1409384.

2000

4. Z. N. Yu, P. Deshpande, W. Wu, J. Wang, and S. Y. Chou, “Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography” Applied Physics Letters. DOI: 10.1063/1.1288674.

1999

3. J. Wang, S. Schablitsky, Z. N. Yu, W. Wu, and S. Y. Chou, “Fabrication of a new broadband waveguide polarizer with a double-layer 190 nm period metal-gratings using nanoimprint lithography” Journal of Vacuum Science & Technology B. DOI: 10.1116/1.590933.

2. B. Cui, W. Wu, L. S. Kong, X. Y. Sun, and S. Y. Chou, “Perpendicular quantized magnetic disks with 45 Gbits on a 4◊4 cm2 area” Journal of Applied Physics. DOI: 10.1063/1.369885.

1998

1. W. Wu, B. Cui, X. Y. Sun, W. Zhang, L. Zhuang, L. S. Kong, and S. Y. Chou, “Large area high density quantized magnetic disks fabricated using nanoimprint lithography” Journal of Vacuum Science & Technology B. DOI: 10.1116/ 1.590417.

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  • June 2017: Our paper “All-Dielectric Heterogeneous Metasurface as an Efficient Ultra-Broadband Reflector” was just published on Advanced Optical Materials.
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