Publications:

2016

94. Y. Yao, H. Liu, Y. Wang, Y. Li, B. Song, R. P. Wang, M. L. Povinelli, and W. Wu, "Nanoimprint-defined, large-area meta-surfaces for unidirectional optical transmission with superior extinction in the visible-to-infrared range" Optics Express, 24(14), 15362-15372. doi: 10.1364/Oe.24.015362.

93. Yifei Wang, John Stang, Meng Yu, Maksym Tsvetkov, Chi-Chan Wu, Xuan Qin, Eugene Chung, Mahta Moghaddam, Wei Wu, "Microwave Selective Heating Enhancement for Cancer Hyperthermia Therapy Based on Lithographically Defined Micro/Nanoparticles" Advanced Materials Technologies, 1(3), 1600038-n/a. doi: 10.1002/admt.201600038.

92. Y. Wang, J. Stang, E. Chung, M. Moghaddam, and W. Wu, "Micro-resonator for Microwave Cancer Therapy" IEEE Journal on Multiscale and Multiphysics Computational Techniques, 1, 36-39. doi: 10.1109/jmmct.2016.2592379.

91. J.-B. Wu, H. Zhao, Y. Li, D. Ohlberg, W. Shi, W. Wu, H. Wang, P.-H. Tan, "Monolayer Molybdenum Disulfide Nanoribbons with High Optical Anisotropy" Advanced Optical Materials, n/a-n/a. doi: 10.1002/adom.201500707.

2015

90. Yuanrui Li, Huachao Mao, He Liu, Yuhan Yao, Yifei Wang, Boxiang Song, Yong Chen and Wei Wu, "Stereolithography with variable resolutions using optical filter with high-contrast gratings" Journal of Vacuum Science & Technology B, 33(6)06F604.

89. Yifei Wang, He Liu, Yuanrui Li and Wei Wu, "Low DC-bias silicon nitride anisotropic etching" Journal of Vacuum Science & Technology B, 33(6)06FA01.

88.  Yuhan Yao, Yifei Wang, He Liu, Yuanrui Li, Boxiang Song, Wei Wu, "Line width tuning and smoothening for periodical grating fabrication in nanoimprint lithography" Applied Physics A, 121(2), 399-403. doi: 10.1007/s00339-015-9278-x.

87.  Yuhan Yao, He Liu, Yifei Wang, Yuanrui Li, Boxiang Song, Alexandre Bratkovsk, Shih-Yuan Wang, Wei Wu, "Nanoimprint lithography: an enabling technology for nanophotonics (Invited)" Applied Physics A, 121(2), 327-333. doi: 10.1007/s00339-015-9438-z.

86. Yuhan Yao, He Liu, Wei Wu, "Fabrication of High Contrast Gratings for the Spectrum Splitting Dispersive Element in a Concentrated Photovoltaic System" J. Vis. Exp. (101), e52913. doi: doi:10.3791/52913.

85.  Q. Xia, W. Wu, G.-Y. Jung, S. Pi, P. Lin, Y. Chen, X. Li, Z. Li, S.-Y. Wang, R. S. Williams, "Nanoimprint lithography enables memristor crossbars and hybrid circuits" Applied Physics A: Materials Science & Processing 106 (4), 767-772 (2012).

84. Steven J. Barcelo, Wei Wu, Xuema Li, Zhiyong Li, R. Stanley Williams, "Nanoimprint lithography of plasmonic platforms for SERS applications (Invited)" Applied Physics A, 121 (2), 443-449. doi: 10.1007/s00339-015-9073-8.

2014

83. Yuhan Yao, He Liu and Wei Wu, "Fabrication of high contrast grating using nanoimprint lithography and its application in improving solar conversion efficiency by parallel spectrum splitting" Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2014 32(6).

82.  He Liu, Yuhan Yao, Yifei Wang and Wei Wu, "A full color reflective display system based on high contrast gratings" Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2014 32(6)

81.  Yuhan Yao, He Liu and Wei Wu, "Spectrum splitting using multi-layer sub-wavelength high-index-contrast grating for solar energy harvesting efficiency improvement (Invited rapid)" Applied Physics A, 2014. 115(3): p. 713-719.

80.  D.J. Cho, W. Wu, F. Wang, and Y.R. Shen, "Probing the plasmonic band structure of an optical metamaterial" Physical Review B, 2014. 89(3): p. 035434.

79.  A.N. Abbas, G. Liu, B. Liu, L. Zhang, H. Liu, D. Ohlberg, W. Wu, and C. Zhou, "Patterning, Characterization, and Chemical Sensing Applications of Graphene Nanoribbon Arrays Down to 5 nm Using Helium Ion Beam Lithography" Acs Nano, 2014, 2014. 8(2): p. 1538-1546.

78.  X. Hu, T. Yang, R. Gu, Y. Cui, C. Yuan, H. Ge, W. Wu, W. Li, and Y. Chen, "A degradable polycyclic cross-linker for UV-curing nanoimprint lithography" Journal of Materials Chemistry C, 2014. 2(10): p. 1836-1843.

2013

77.  Y. Shen, L. Yao, Z. Li, J. Kou, Y. Cui, J. Bian, C. Yuan, H. Ge, W.-D. Li, W. Wu, and Y. Chen, "Double transfer UV-curing nanoimprint lithography" Nanotechnology, 2013. 24(46): p. 465304.

2012

76. W.-D. Li, W. Wu, and R.S. Williams, "Combined helium ion beam and nanoimprint lithography attains 4?nm half-pitch dense patterns" Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2012. 30(6): p. 06F304.

75. Steven J. Barcelo, Ansoon Kim, Wei Wu, and Zhiyong Li, "Fabrication of Deterministic Nanostructure Assemblies with Sub-nanometer Spacing Using a Nanoimprinting Transfer Technique" Acs Nano, 2012. 6(7): p. 6446-6452.

74. S.J. Barcelo, M. Hu, A. Kim, W. Wu, and Z.Y. Li,"Selective transfer of nanostructured assemblies onto an arbitrary substrate by nanoimprinting" Alternative Lithographic Technologies Iv, 2012. 8323.

73. W. Wu, R. Walmsley, W.-D. Li, X. Li and R. Williams, "Nanoimprint lithography with ≤60 nm overlay precision" Applied Physics A: Materials Science & Processing 106 (4), 767-772 (2012).

72.  J.J. Yang, M.X. Zhang, M.D. Pickett, F. Miao, J.P. Strachan, W.D. Li, W. Yi, D.A.A. Ohlberg, B.J. Choi, W. Wu, J.H. Nickel, G. Medeiros-Ribeiro, and R.S. Williams, "Engineering nonlinearity into memristors for passive crossbar applications" Applied Physics Letters, 2012. 100(11).

71.  D.F. Xia, L. Ye, X. Guo, Y.S. Cui, J.Z. Zhang, C.S. Yuan, H.X. Ge, W. Wu, and Y.F. Chen, "A dual-curable transfer layer for adhesion enhancement of a multilayer UV-curable nanoimprint resist system. (Invited)" Applied Physics A-Materials Science & Processing, 108(1), 1-6 (2012).

70. J. Zhang, X. Hu, J. Zhang, Y. Cui, C. Yuan, H. Ge, Y. Chen, W. Wu, and Q. Xia,"A fast thermal-curing nanoimprint resist based on cationic polymerizable epoxysiloxane" Nanoscale Research Letters, 2012. 7(1): p. 380.

69. Q.Q. Gan, W.L. Bai, S.H. Jiang, Y.K. Gao, W.D. Li, W. Wu, and F.J. Bartoli, "Short-Range Surface Plasmon Polaritons for Extraordinary Low Transmission Through Ultra-Thin Metal Films with Nanopatterns" Plasmonics, 2012. 7(1): p. 47-52.

2011

68.  Q. F. Xia, M. D. Pickett, J. J. Yang, M. X. Zhang, J. Borghetti, X. M. Li, W. Wu, G. Medeiros-Ribeiro, and R. S. Williams, "Impact of geometry on the performance of memristive nanodevices" Nanotechnology 22 (25) (2011).

67.  F. S. Ou, M. Hu, I. Naumov, A. Kim, W. Wu, A. M. Bratkovsky, X. M. Li, R. S. Williams, and Z. Y. Li, "Hot-Spot Engineering in Polygonal Nanofinger Assemblies for Surface Enhanced Raman Spectroscopy" Nano Lett. 11 (6), 2538-2542 (2011).

66. Qiangfei Xia, Matthew D. Pickett, J. Joshua Yang, Xuema Li, Wei Wu, Gilberto Medeiros-Ribeiro, R. Stanley Williams, "Two- and Three-Terminal Resistive Switches: Nanometer-Scale Memristors and Memistors" Nano Lett. 10 (8), 2909-2914 (2010).

2010

65.  Q. F. Xia, J. J. S. Yang, W. Wu, X. M. Li, and R. S. Williams, "Self-Aligned Memristor Cross-Point Arrays Fabricated with One Nanoimprint Lithography Step" Nano Lett. 10 (8), 2909-2914 (2010).

64. W. Wu, M. Hu, F. S. Ou, R. S. Williams, and Z. Y. Li, "Rational Engineering of Highly Sensitive SERS Substrate Based on Nanocone Structures" in Advanced Environmental, Chemical, and Biological Sensing Technologies Vii, edited by T. VoDinh, R. A. Lieberman, and G. Gauglitz (Spie-Int Soc Optical Engineering, Bellingham, 2010), Vol. 7673.

63.  W. Wu, M. Hu, F. S. Ou, Z. Y. Li, and R. S. Williams, "Cones fabricated by 3D nanoimprint lithography for highly sensitive surface enhanced Raman spectroscopy" Nanotechnology 21 (25) (2010).

62.  D. B. Strukov, D. R. Stewart, J. Borghetti, X. Li, M. Pickett, G. M. Ribeiro, W. Robinett, G. Snider, J. P. Strachan, W. Wu, Q. Xia, J. J. Yang, R. S. Williams, "Hybrid CMOS/Memristor Circuits" 2010 Ieee International Symposium on Circuits and Systems (Ieee, New York, 2010), pp. 1967-1970.

61.  M. Hu, F. S. Ou, W. Wu, I. Naumov, X. M. Li, A. M. Bratkovsky, R. S. Williams, and Z. Y. Li, "Gold Nanofingers for Molecule Trapping and Detection" J Am Chem Soc 132 (37), 12820-12822 (2010).

60.  P. Chaturvedi, W. Wu, V. J. Logeeswaran, Z. N. Yu, M. S. Islam, S. Y. Wang, R. S. Williams, and N. X. Fang, "A smooth optical superlens" Appl. Phys. Lett. 96 (4), - (2010).

2009

59.  Q. F. Xia, W. Robinett, M. W. Cumbie, N. Banerjee, T. J. Cardinali, J. J. Yang, W. Wu, X. M. Li, W. M. Tong, D. B. Strukov, G. S. Snider, G. Medeiros-Ribeiro, and R. S. Williams, "Memristor-CMOS Hybrid Integrated Circuits for Reconfigurable Logic" Nano Lett. 9 (10), 3640-3645 (2009).

58.  W. Wu, E. Ponizovskaya, E. Kim, D. Cho, A. Bratkovsky, Z. N. Yu, Q. F. Xia, X. M. Li, Y. R. Shen, S. Y. Wang, and R. S. Williams, "Geometrical dependence of optical negative index meta-materials at 1.55 mu m" Appl. Phys. A-Mater. Sci. Process. 95 (4), 1119-1122 (2009).

57.  L. Vj, N. P. Kobayashi, M. S. Islam, W. Wu, P. Chaturvedi, N. X. Fang, S. Y. Wang, and R. S. Williams, "Ultrasmooth Silver Thin Films Deposited with a Germanium Nucleation Layer" Nano Lett. 9 (1), 178-182 (2009).

56. D. Morecroft, J. K. W. Yang, S. Schuster, K. K. Berggren, Q. F. Xia, W. Wu, and R. S. Williams, "Sub-15 nm nanoimprint molds and pattern transfer" J. Vac. Sci. Technol. B 27 (6), 2837-2840 (2009).

55.  Z. W. Li, Y. N. Gu, L. Wang, H. X. Ge, W. Wu, Q. F. Xia, C. S. Yuan, Y. Chen, B. Cui, and R. S. Williams, "Hybrid Nanoimprint-Soft Lithography with Sub-15 nm Resolution" Nano Lett. 9 (6), 2306-2310 (2009).

54. D. J. Cho, W. Wu, E. Ponizovskaya, P. Chaturvedi, A. M. Bratovksy, S. Y. Wang, X. A. Zhang, F. Wang, and Y. R. Shen, "Ultrafast response of negative index metamaterials in the near-infrared" Advanced Fabrication Technologies for Micro/Nano Optics and Photonics Ii 7205, -259 (2009).

53.  D. J. Cho, W. Wu, E. Ponizovskaya, P. Chaturvedi, A. M. Bratkovsky, S. Y. Wang, X. Zhang, F. Wang, and Y. R. Shen, "Ultrafast modulation of optical metamaterials" Opt Express 17 (20), 17652-17657 (2009).

52.  D. J. Cho, W. Wu, E. Ponizovskaya, P. Chaturvedi, A. M. Bratkovsky, S. Y. Wang, X. Zhang, F. Wang, and Y. R. Shen, "Ultrafast modulation of optical metamaterials" 2009 Conference on Lasers and Electro-Optics and Quantum Electronics and Laser Science Conference (Cleo/Qels 2009), Vols 1-5, 2249-2250 3405 (2009).

51.  J. Borghetti, Z. Y. Li, J. Straznicky, X. M. Li, D. A. A. Ohlberg, W. Wu, D. R. Stewart, and R. S. Williams, "A hybrid nanomemristor/transistor logic circuit capable of self-programming" P Natl Acad Sci USA 106 (6), 1699-1703 (2009).

2008

50. W. Wu, W. M. Tong, J. Bartman, Y. F. Chen, R. Walmsley, Z. N. Yu, Q. F. Xia, I. Park, C. Picciotto, J. Gao, S. Y. Wang, D. Morecroft, J. Yang, K. K. Berggren, and R. S. Williams, "Sub-10 nm Nanoimprint Lithography by Wafer Bowing" Nano Lett. 8 (11), 3865-3869 (2008).

49.  L. Tao, S. Ramachandran, C. T. Nelson, M. Lin, L. J. Overzet, M. Goeckner, G. Lee, C. G. Willson, W. Wu, and W. Hu, "Durable diamond-like carbon templates for UV nanoimprint lithography" Nanotechnology 19 (10) (2008).

48. V. J. Logeeswaran, A. Sarkar, M. S. Islam, N. P. Kobayashi, J. Straznicky, X. Li, W. Wu, S. Mathai, M. R. T. Tan, S. Y. Wang, and R. S. Williams, "A 14-ps full width at half maximum high-speed photoconductor fabricated with intersecting InP nanowires on an amorphous surface" Appl. Phys. A-Mater. Sci. Process. 91 (1), 1-5 (2008).

47.  Z. Y. Li, M. D. Pickett, D. Stewart, D. A. A. Ohlberg, X. M. Li, W. Wu, W. Robinett, and R. S. Williams, "Experimental demonstration of a defect-tolerant nanocrossbar demultiplexer" Nanotechnology 19 (16) (2008).

46.  Z. Y. Li, X. M. Li, D. A. A. Ohlberg, J. Straznicky, W. Wu, Z. N. Yu, J. Borghetti, W. Tong, D. Stewart, and R. S. Williams, "Fabrication and test of nano crossbar switches/MOSFET hybrid circuits by imprinting lithography" P Soc Photo-Opt Ins 6921, 92108-92108 92815 (2008).

45. E. Kim, F. Wang, W. Wu, Z. N. Yu, and Y. R. Shen, "Nonlinear Optical Spectroscopy of Photonic Metamaterials" 2008 Conference on Lasers and Electro-Optics & Quantum Electronics and Laser Science Conference, Vols 1-9, 3191-3192 3638 (2008).

44. Evgenia Kim, Feng Wang, Wei Wu, Zhaoning Yu, and Y. Ron Shen, "Nonlinear optical spectroscopy of photonic metamaterials" Physical Review B (Condensed Matter and Materials Physics) 78 (11), 113102 (2008).

2007

43. W. Wu, Z. N. Yu, S. Y. Wang, R. S. Williams, Y. M. Liu, C. Sun, X. Zhang, E. Kim, Y. R. Shen, and N. X. Fang, "Midinfrared metamaterials fabricated by nanoimprint lithography" Appl. Phys. Lett. 90 (6) (2007).

42. W. Wu, E. Kim, E. Ponizovskaya, Y. Liu, Z. Yu, N. Fang, Y. R. Shen, A. M. Bratkovsky, W. Tong, C. Sun, X. Zhang, S. Y. Wang, and R. S. Williams, "Optical Metamaterials at near and mid-IR range fabricated by nanoimprint lithography" Appl. Phys. A-Mater. Sci. Process. 87 (2), 143-150 (2007).

41. L. Vj, N. P. Kobayashi, W. Wu, M. S. Islam, N. X. L. Fang, S. Y. Wang, and R. S. Williams, "Smooth Ag film deposited using e-beam evaporated Ge as an intermediate layer for applications in nanoscale devices and optical superlens" Mater Res Soc Symp P 990, 171-175338 (2007).

40. L. Vj, M. L. Chan, M. S. Islam, D. A. Horsley, W. Wu, S. Y. Wang, and R. S. Williams, "Surface deformation of metal films under controlled pressure for generating ultra-flat metal surfaces" Mater Res Soc Symp P 990, 177-182 338 (2007).

39. D. R. Stewart, G. Gibson, G. Y. Jung, W. Wu, J. Straznicky, W. Tong, Z. Li, and R. S. Williams, "Direct-write programming of nanoscale demultiplexer arrays" Nanotechnology 18 (41) (2007).

38. V.J. Logeeswaran, A.N. Stameroff, M.S. Islam, W. Wu, A.M. Bratkovsky, P.J. Kuekes, S.Y. Wang, and R.S. Williams, "Switching between positive and negative permeability by photoconductive coupling for modulation of electromagnetic radiation" Appl Phys A 87 (2), 209-216 (2007).

37. V. J. Logeeswaran, M. L. Chan, Y. Bayam, M. S. Islam, D. A. Horsley, X. Li, W. Wu, S. Y. Wang, and R. S. Williams, "Ultra-smooth metal surfaces generated by pressure-induced surface deformation of thin metal films" Appl. Phys. A-Mater. Sci. Process. 87 (2), 187-192 (2007).

36.  E. Kim, Y. R. Shen, W. Wu, E. Ponizovskaya, Z. Yu, A. M. Bratkovsky, S. Y. Wang, and R. S. Williams, "Modulation of negative index metamaterials in the near-IR range" Appl. Phys. Lett. 91 (17) (2007).

35.  A. S. P. Chang, H. Tan, S. F. Bai, W. Wu, Z. N. Yu, and S. Y. Chou, "Tunable external cavity laser with a liquid-crystal subwavelength resonant grating filter as wavelength-selective mirror" Ieee Photonic Tech L 19 (13-16), 1099-1101 (2007).

34.  A. S. P. Chang, K. J. Morton, H. Tan, P. E. Murphy, W. Wu, and S. Y. Chou, "Tunable liquid crystal-resonant grating filter fabricated by nanoimprint lithography" Ieee Photonic Tech L 19 (17-20), 1457-1459 (2007).

2006

33.  Z. Yu, W. Wu, G.-Y. Jung, D.L. Olynick, J. Straznicky, X. Li, Z. Li, W.M. Tong, J.A. Liddle, S.-Y. Wang, and R.S. Williams, "Fabrication of 30 nm pitch imprint moulds by frequency doubling for nanowire arrays" Nanotechnology 17 (19), 4956-4961 (2006).

32. W. Wu, E. Kim, E. Ponizovskaya, Y. Liu, Z. Yu, A. Bratkovsky, N. Fang, X. Zhang, S. Y. Wang, and R. S. Williams, "Fabrication of optical meta-structure at infrared rang using nanoimprint lithography" Proceedings of International Symposium on Biophotonics, Nanophotonics and Metamaterials, 418-419 552 (2006).

31.  C. Stuart, Q. F. Xu, R. J. Tseng, Y. Yang, H. T. Hahn, Y. Chen, W. Wu, and R. S. Williams, "Nanofabrication module integrated with optical aligner" J. Vac. Sci. Technol. B 24 (2), 539-542 (2006).

30. V.J. Logeeswaran, M.S. Islam, M.L. Chan, D.A. Horsley, W. Wu, S.-Y. Wang, and R.S. Williams, "Realization of 3D isotropic negative index materials using massively parallel and manufacturable microfabrication and micromachlning technology" Materials Research Society Symposium Proceedings, San Francisco, CA, 2006.

29.  N. H. Li, W. Wu, and S. Y. Chou, "Sub-20-nm alignment in nanoimprint lithography using Moire fringe" Nano Lett. 6 (11), 2626-2629 (2006).

28.  G.-Y. Jung, E. Johnston-Halperin, W. Wu, Z. Yu, S.-Y. Wang, W.M. Tong, Z. Li, J.E. Green, B.A. Sheriff, A. Boukai, Y. Bunimovich, J.R. Heath, and R.S. Williams, "Circuit fabrication at 17 nm half-pitch by nanoimprint lithography" Nano Lett. 6 (3), 351-354 (2006).

27.  J. Gao, C. Picciotto, W. Wu, I. Park, and W. M. Tong, "From nanoscale displacement sensing and estimation to nanoscale alignment" J. Vac. Sci. Technol. B 24 (6), 3094-3100 (2006).

26. J. Gao, C. Picciotto, W. Wu, I. Park, and W. M. Tong, "nDSE based overlay alignment: Enabling technology for nano metrology and fabrication" Proceedings of SPIE - The International Society for Optical Engineering, San Jose, CA, 2006.

25.  B. Cui, W. Wu, C. Keimel, and S.Y. Chou, "Filling of nano-via holes by laser-assisted direct imprint" Microelectron Eng 83 (4-9 SPEC. ISS.), 1547-1550 (2006).

2005

24. W. Wu, G.-Y. Jung, D.L. Olynick, J. Straznicky, Z. Li, X. Li, D.A.A. Ohlberg, Y. Chen, S.-Y. Wang, J.A. Liddle, W.M. Tong, and R.S. Williams, "One-kilobit cross-bar molecular memory circuits at 30-nm half-pitch fabricated by nanoimprint lithography" Appl Phys A 80 (6), 1173-1178 (2005).

23. W.M. Tong, S.D. Hector, G.-Y. Jung, W. Wu, J. Ellenson, K. Kramer, T. Hostetler, S.K. Richards, and R.S. Williams, "Nanoimprint lithography: The path toward high tech, low cost devices," Progress in Biomedical Optics and Imaging - Proceedings of SPIE, San Jose, CA, 2005

22. C. Picciotto, J. Gao, E. Hoarau, W. Wu, W. Jackson, and W.M. Tong, "Overlay alignment using optical microscopy and arbitrary surface features," J Vac Sci Technol B Microelectron Nanometer Struct 23 (6), 3047-3051 (2005).

21. C. Picciotto, J. Gao, E. Hoarau, and W. Wu, "Image displacement sensing (NDSE) for achieving overlay alignment," Appl. Phys. A-Mater. Sci. Process. 80 (6), 1287-1299 (2005).

20.  X. G. Liang, W. Zhang, M. T. Li, Q. F. Xia, W. Wu, H. X. Ge, X. Y. Huang, and S. Y. Chou, "Electrostatic force-assisted nanoimprint lithography (EFAN)," Nano Lett. 5 (3), 527-530 (2005).

19.  G.-Y. Jung, Z. Li, W. Wu, S. Ganapathiappan, X. Li, D.L. Olynick, S.Y. Wang, W.M. Tong, and R.S. Williams, "Improved pattern transfer in nanoimprint lithography at 30 nm half-pitch by substrate-surface functionalization," Langmuir 21 (14), 6127-6130 (2005).

18.  G.-Y. Jung, Z. Li, W. Wu, Y. Chen, D.L. Olynick, S.-Y. Wang, W.M. Tong, and R.S. Williams, "Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography," Langmuir 21 (4), 1158-1161 (2005).

17. G.Y. Jung, W. Wu, Z. Li, S.Y. Wang, W.M. Tong, and R.S. Williams, "Surface engineering for resolution enhancement in nanoimprint lithography" Progress in Biomedical Optics and Imaging - Proceedings of SPIE, San Jose, CA, 2005.

16. G.Y. Jung, W. Wu, Z. Li, S.Y. Wang, W.M. Tong, and R. Stanley Williams, "Resolution enhancement in nanoimprinting by surface energy engineering" 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings, Anaheim, CA, 2005.

15. G. Y. Jung, W. Wu, H. Lee, S. Y. Wang, W. M. Tong, and R. S. Williams, "Fabrication of multi-bit crossbar circuits at sub-50 nm half-pitch by using UV-based nanoimprint lithography," J. Photopolym Sci. Technol. 18 (5), 565-570 (2005).

14. G. Y. Jung, W. Wu, S. Ganapathiappan, D. A. A. Ohlberg, M. S. Islam, X. Li, D. L. Olynick, H. Lee, Y. Chen, S. Y. Wang, W. M. Tong, and R. S. Williams, "Issues on nanoimprint lithography with a single-layer resist structure," Appl. Phys. A-Mater. Sci. Process. 81 (7), 1331-1335 (2005).

13. H. X. Ge, W. Wu, Z. Y. Li, G. Y. Jung, D. Olynick, Y. F. Chen, J. A. Liddle, S. Y. Wang, and R. S. Williams, "Cross-linked polymer replica of a nanoimprint mold at 30 nm half-pitch," Nano Lett. 5 (1), 179-182 (2005).

2004

12. M. D. Austin, H. X. Ge, W. Wu, M. T. Li, Z. N. Yu, D. Wasserman, S. A. Lyon, and S. Y. Chou, "Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography," Appl. Phys. Lett. 84 (26), 5299-5301 (2004).

2003

11.  Z. N. Yu, H. Gao, W. Wu, H. X. Ge, and S. Y. Chou, "Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff," J. Vac. Sci. Technol. B 21 (6), 2874-2877 (2003).

10.  Z. N. Yu, L. Chen, W. Wu, H. X. Ge, and S. Y. Chou, "Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography," J. Vac. Sci. Technol. B 21 (5), 2089-2092 (2003).

9.   Q. F. Xia, C. Keimel, H. X. Ge, Z. N. Yu, W. Wu, and S. Y. Chou, "Ultrafast patterning of nanostructures in polymers using laser assisted nanoimprint lithography," Appl. Phys. Lett. 83 (21), 4417-4419 (2003).

8.   W. Wu, J. Gu, H. X. Ge, C. Keimel, and S. Y. Chou, "Room-temperature Si single-electron memory fabricated by nanoimprint lithography," Appl. Phys. Lett. 83 (11), 2268-2270 (2003).

7.    X. Y. Lei, L. Wu, P. Deshpande, Z. N. Yu, W. Wu, H. X. Ge, and S. Y. Chou, "100 nm period gratings produced by lithographically induced self-construction," Nanotechnology 14 (7), 786-790 (2003).

2002

6.    H. Cao, Z. N. Yu, J. Wang, J. O. Tegenfeldt, R. H. Austin, E. Chen, W. Wu, and S. Y. Chou, "Fabrication of 10 nm enclosed nanofluidic channels," Appl. Phys. Lett. 81 (1), 174-176 (2002).

2001

5.    Z. N. Yu, W. Wu, L. Chen, and S. Y. Chou, "Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications," J. Vac. Sci. Technol. B 19 (6), 2816-2819 (2001).

2000

4.   Z. N. Yu, P. Deshpande, W. Wu, J. Wang, and S. Y. Chou, "Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography," Appl. Phys. Lett. 77 (7), 927-929 (2000).

1999

3.    J. Wang, S. Schablitsky, Z. N. Yu, W. Wu, and S. Y. Chou, "Fabrication of a new broadband waveguide polarizer with a double-layer 190 nm period metal-gratings using nanoimprint lithography," J. Vac. Sci. Technol. B 17 (6), 2957-2960 (1999).

2.   B. Cui, W. Wu, L. S. Kong, X. Y. Sun, and S. Y. Chou, "Perpendicular quantized magnetic disks with 45 Gbits on a 4x4 cm(2) area," J. Appl. Phys. 85 (8), 5534-5536 (1999).

1998

1.    W. Wu, B. Cui, X. Y. Sun, W. Zhang, L. Zhuang, L. S. Kong, and S. Y. Chou, "Large area high density quantized magnetic disks fabricated using nanoimprint lithography," J. Vac. Sci. Technol. B 16 (6), 3825-3829 (1998).

 

Email: wu.w@usc.edu
Phone: 213-740-3085
Office: USC Powell Hall 632
  • Dr. Wei Wu joined the Ming Hsieh Department of Electrical Engineering at the University of Southern California on January 1st, 2012.
  • Recruiting Ph.D. students